PVD Degas device for wafer Physical Vapor Deposition process

The present invention relates to a degas apparatus for a wafer physical vapor deposition (PVD) process. More specifically, the present invention relates to a degas apparatus configured to heat a wafer and burn foreign matter, comprising: a frame main body; a housing main body placed on an upper side...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	LEE, HEUNG YEOL, KIM HYOUNG JUN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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