Pipe protecting apparatus and exhaust system for harmful gas having the same

The present invention relates to a pipe protection device used in a gas-using process such as semiconductor, display, and LED fields, and a harmful gas exhaust system having the same. In particular, the pipe protection device and the harmful gas exhaust system having the same can effectively prevent...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	KWEN CHANG GU, KIM HYUN SIN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BLASTING ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS HEATING JOINTS OR FITTINGS FOR PIPES LIGHTING MEANS FOR THERMAL INSULATION IN GENERAL MECHANICAL ENGINEERING PIPES SUPPORTS FOR PIPES, CABLES OR PROTECTIVE TUBING THERMAL INSULATION IN GENERAL WEAPONS
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Beschreibung
Zusammenfassung:	The present invention relates to a pipe protection device used in a gas-using process such as semiconductor, display, and LED fields, and a harmful gas exhaust system having the same. In particular, the pipe protection device and the harmful gas exhaust system having the same can effectively prevent particles or gas powder from depositing and accumulating on an inner wall of the pipe of the harmful gas exhaust system. The harmful gas exhaust system includes a pump, a scrubber, a pipe, and a pipe protection device. 본 발명은 반도체, 디스플레이, LED 분야 등 가스(gas) 사용 공정에서 사용되는 배관 보호 장치 및 이를 구비한 유해 가스 배기 시스템에 관한 것으로서, 특히, 유해 가스 배기 시스템의 배관 내벽에 파티클 또는 가스 파우더가 침전되어 쌓이는 것을 효과적으로 방지할 수 있는 배관 보호 장치와 이를 구비한 유해 가스 배기 시스템에 관한 것이다.