Heat source device substrate support device and substrate processing facility
The present invention relates to a heat source device, a substrate supporting device, and a substrate processing facility having the same. The heat source device includes: a chamber in which an internal space in which a substrate is processed is formed; a substrate support device installed in the ch...
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| creator | SONG, DAE SEOK YEON, KANG HEUM NAM, WON SIK |
| description | The present invention relates to a heat source device, a substrate supporting device, and a substrate processing facility having the same. The heat source device includes: a chamber in which an internal space in which a substrate is processed is formed; a substrate support device installed in the chamber to stably support the substrate; and a heat source device installed in the chamber to uniformly heat the substrate. The substrate can be uniformly heated, and the substrate can be stably supported.
본 발명은 열원 장치, 기판 지지장치 및 이를 구비하는 기판 처리 설비에 관한 것으로서, 기판이 처리되는 내부 공간이 형성되는 챔버와, 기판을 안정적으로 지지하도록 챔버에 설치되는 기판 지지장치 및 기판을 균일하게 가열하도록 상기 챔버에 설치되는 열원장치를 포함하여, 기판을 균일하게 가열할 수 있고, 기판의 안정적으로 지지할 수 있다. |
| format | Patent |
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본 발명은 열원 장치, 기판 지지장치 및 이를 구비하는 기판 처리 설비에 관한 것으로서, 기판이 처리되는 내부 공간이 형성되는 챔버와, 기판을 안정적으로 지지하도록 챔버에 설치되는 기판 지지장치 및 기판을 균일하게 가열하도록 상기 챔버에 설치되는 열원장치를 포함하여, 기판을 균일하게 가열할 수 있고, 기판의 안정적으로 지지할 수 있다.</description><language>eng ; kor</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC HEATING ; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2021</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20211208&DB=EPODOC&CC=KR&NR=102335630B1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76318</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20211208&DB=EPODOC&CC=KR&NR=102335630B1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SONG, DAE SEOK</creatorcontrib><creatorcontrib>YEON, KANG HEUM</creatorcontrib><creatorcontrib>NAM, WON SIK</creatorcontrib><title>Heat source device substrate support device and substrate processing facility</title><description>The present invention relates to a heat source device, a substrate supporting device, and a substrate processing facility having the same. The heat source device includes: a chamber in which an internal space in which a substrate is processed is formed; a substrate support device installed in the chamber to stably support the substrate; and a heat source device installed in the chamber to uniformly heat the substrate. The substrate can be uniformly heated, and the substrate can be stably supported.
본 발명은 열원 장치, 기판 지지장치 및 이를 구비하는 기판 처리 설비에 관한 것으로서, 기판이 처리되는 내부 공간이 형성되는 챔버와, 기판을 안정적으로 지지하도록 챔버에 설치되는 기판 지지장치 및 기판을 균일하게 가열하도록 상기 챔버에 설치되는 열원장치를 포함하여, 기판을 균일하게 가열할 수 있고, 기판의 안정적으로 지지할 수 있다.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC HEATING</subject><subject>ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2021</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZPD1SE0sUSjOLy1KTlVISS3LBFLFpUnFJUWJJSBWQUF-UQlMIjEvBUmyoCg_ObW4ODMvXSEtMTkzJ7OkkoeBNS0xpziVF0pzMyi7uYY4e-imFuTHpxYXJCan5qWWxHsHGRoYGRubmhkbODkZGhOnCgAEQTfV</recordid><startdate>20211208</startdate><enddate>20211208</enddate><creator>SONG, DAE SEOK</creator><creator>YEON, KANG HEUM</creator><creator>NAM, WON SIK</creator><scope>EVB</scope></search><sort><creationdate>20211208</creationdate><title>Heat source device substrate support device and substrate processing facility</title><author>SONG, DAE SEOK ; YEON, KANG HEUM ; NAM, WON SIK</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR102335630BB13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2021</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC HEATING</topic><topic>ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>SONG, DAE SEOK</creatorcontrib><creatorcontrib>YEON, KANG HEUM</creatorcontrib><creatorcontrib>NAM, WON SIK</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SONG, DAE SEOK</au><au>YEON, KANG HEUM</au><au>NAM, WON SIK</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Heat source device substrate support device and substrate processing facility</title><date>2021-12-08</date><risdate>2021</risdate><abstract>The present invention relates to a heat source device, a substrate supporting device, and a substrate processing facility having the same. The heat source device includes: a chamber in which an internal space in which a substrate is processed is formed; a substrate support device installed in the chamber to stably support the substrate; and a heat source device installed in the chamber to uniformly heat the substrate. The substrate can be uniformly heated, and the substrate can be stably supported.
본 발명은 열원 장치, 기판 지지장치 및 이를 구비하는 기판 처리 설비에 관한 것으로서, 기판이 처리되는 내부 공간이 형성되는 챔버와, 기판을 안정적으로 지지하도록 챔버에 설치되는 기판 지지장치 및 기판을 균일하게 가열하도록 상기 챔버에 설치되는 열원장치를 포함하여, 기판을 균일하게 가열할 수 있고, 기판의 안정적으로 지지할 수 있다.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS ELECTRIC HEATING ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES |
| title | Heat source device substrate support device and substrate processing facility |
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