APPARATUS FOR TESTING ELECTROSTATIC CHUCKS

Disclosed is a device for testing whether the temperature of an adsorbed substrate is uniformly controlled during substrate processing. The device includes a stage which has an electrostatic chuck placed on a top plate thereof and a chamber housing that can be lifted along first and second guides in...

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Hauptverfasser: KIM SUNG MAN, LEE JUN HO, LEE KYU YOUNG, KANG CHANG SEONG
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Sprache:eng ; kor
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creator KIM SUNG MAN
LEE JUN HO
LEE KYU YOUNG
KANG CHANG SEONG
description Disclosed is a device for testing whether the temperature of an adsorbed substrate is uniformly controlled during substrate processing. The device includes a stage which has an electrostatic chuck placed on a top plate thereof and a chamber housing that can be lifted along first and second guides installed on the top plate. A chamber is defined by the stage and the chamber housing. A heater is prepared in the chamber housing to be lifted. A substrate is adsorbed by the electrostatic chuck, and temperature sensors are disposed at a plurality of positions on the substrate. Temperature values measured by the temperature sensors are sent to a control unit, and the temperature distribution of the substrate heated by the heater is analyzed. 기판 처리 중 흡착된 기판의 온도가 균일 제어되는지 여부를 테스트하기 위한 장치가 소개된다. 장치는 탑플레이트 상에 정전척이 놓이는 스테이지 및 탑플레이트 상에 설치된 제1 및 제2 가이드를 따라 승강 가능한 챔버 하우징을 구비한다. 스테이지와 챔버 하우징에 의해 챔버가 규정된다. 챔버 하우징 내에는 승강 가능하게 히터가 마련된다. 정전척에 의해 기판이 흡착되며, 기판 상의 복수 위치에 온도센서가 배치된다. 이 온도센서에 의해 측정된 온도값은 제어부로 송출되어, 히터에 의해 가열된 기판의 온도 분포가 분석된다.
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The device includes a stage which has an electrostatic chuck placed on a top plate thereof and a chamber housing that can be lifted along first and second guides installed on the top plate. A chamber is defined by the stage and the chamber housing. A heater is prepared in the chamber housing to be lifted. A substrate is adsorbed by the electrostatic chuck, and temperature sensors are disposed at a plurality of positions on the substrate. Temperature values measured by the temperature sensors are sent to a control unit, and the temperature distribution of the substrate heated by the heater is analyzed. 기판 처리 중 흡착된 기판의 온도가 균일 제어되는지 여부를 테스트하기 위한 장치가 소개된다. 장치는 탑플레이트 상에 정전척이 놓이는 스테이지 및 탑플레이트 상에 설치된 제1 및 제2 가이드를 따라 승강 가능한 챔버 하우징을 구비한다. 스테이지와 챔버 하우징에 의해 챔버가 규정된다. 챔버 하우징 내에는 승강 가능하게 히터가 마련된다. 정전척에 의해 기판이 흡착되며, 기판 상의 복수 위치에 온도센서가 배치된다. 이 온도센서에 의해 측정된 온도값은 제어부로 송출되어, 히터에 의해 가열된 기판의 온도 분포가 분석된다.</description><language>eng ; kor</language><subject>BASIC ELECTRIC ELEMENTS ; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOTDIRECTED TO A PARTICULAR RESULT ; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER ; DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g.ARRANGEMENTS FOR COPYING OR CONTROLLING ; ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; GENERATION ; MACHINE TOOLS ; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OFPARTICULAR DETAILS OR COMPONENTS ; METAL-WORKING NOT OTHERWISE PROVIDED FOR ; PERFORMING OPERATIONS ; SEMICONDUCTOR DEVICES ; TRANSPORTING</subject><creationdate>2021</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20210907&amp;DB=EPODOC&amp;CC=KR&amp;NR=102299002B1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20210907&amp;DB=EPODOC&amp;CC=KR&amp;NR=102299002B1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KIM SUNG MAN</creatorcontrib><creatorcontrib>LEE JUN HO</creatorcontrib><creatorcontrib>LEE KYU YOUNG</creatorcontrib><creatorcontrib>KANG CHANG SEONG</creatorcontrib><title>APPARATUS FOR TESTING ELECTROSTATIC CHUCKS</title><description>Disclosed is a device for testing whether the temperature of an adsorbed substrate is uniformly controlled during substrate processing. 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The device includes a stage which has an electrostatic chuck placed on a top plate thereof and a chamber housing that can be lifted along first and second guides installed on the top plate. A chamber is defined by the stage and the chamber housing. A heater is prepared in the chamber housing to be lifted. A substrate is adsorbed by the electrostatic chuck, and temperature sensors are disposed at a plurality of positions on the substrate. Temperature values measured by the temperature sensors are sent to a control unit, and the temperature distribution of the substrate heated by the heater is analyzed. 기판 처리 중 흡착된 기판의 온도가 균일 제어되는지 여부를 테스트하기 위한 장치가 소개된다. 장치는 탑플레이트 상에 정전척이 놓이는 스테이지 및 탑플레이트 상에 설치된 제1 및 제2 가이드를 따라 승강 가능한 챔버 하우징을 구비한다. 스테이지와 챔버 하우징에 의해 챔버가 규정된다. 챔버 하우징 내에는 승강 가능하게 히터가 마련된다. 정전척에 의해 기판이 흡착되며, 기판 상의 복수 위치에 온도센서가 배치된다. 이 온도센서에 의해 측정된 온도값은 제어부로 송출되어, 히터에 의해 가열된 기판의 온도 분포가 분석된다.</abstract><oa>free_for_read</oa></addata></record>
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subjects BASIC ELECTRIC ELEMENTS
COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOTDIRECTED TO A PARTICULAR RESULT
CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g.ARRANGEMENTS FOR COPYING OR CONTROLLING
ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
GENERATION
MACHINE TOOLS
MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OFPARTICULAR DETAILS OR COMPONENTS
METAL-WORKING NOT OTHERWISE PROVIDED FOR
PERFORMING OPERATIONS
SEMICONDUCTOR DEVICES
TRANSPORTING
title APPARATUS FOR TESTING ELECTROSTATIC CHUCKS
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