EUV EUV Pellicle

The present invention relates to an EUV pellicle. More specifically, the present invention is composed of: a frame in which a plurality of ventilation holes are formed in a horizontal direction; a filter vertically embedded in the frame to cover the ventilation hole; an adhesive attached to the uppe...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	SOHN JIN BAE
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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