PROCESSING APPARATUS AND METHOD

Provided are a treatment device and a treatment method applied thereto. The treatment device comprises: a support part which is provided in the air and on which an object to be treated can be placed; a chamber part which is disposed on one side of the support part and has an open portion facing the...

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Bibliographische Detailangaben
Hauptverfasser:	SONG EUN BEOM, BYUN IN JAE, YE SE HUI, SEONG MYUNG JUN, LEE JONG SOO
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING METALLURGY PHYSICS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TESTING
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Beschreibung
Zusammenfassung:	Provided are a treatment device and a treatment method applied thereto. The treatment device comprises: a support part which is provided in the air and on which an object to be treated can be placed; a chamber part which is disposed on one side of the support part and has an open portion facing the object to be treated; a first discharging part, of which at least a portion is disposed in the chamber part; a second discharging part, of which at least a portion is disposed in the chamber part; an inspection part which is connected to the first and second discharging parts and inspects defects in the object to be treated; and a source supply part connected to the chamber part so as to be able to spray a source for depositing a thin film. The treatment device and the treatment method can inspect and repair the object to be treated provided in the air. 본 발명은, 대기 중에 마련되고, 피처리물을 안착시킬 수 있는 지지부, 지지부의 일측에 배치되고, 피처리물과 마주보는 부분이 개구되는 챔버부, 적어도 일부가 챔버부에 배치되는 제1 방출부, 적어도 일부가 챔버부에 배치되는 제2 방출부, 제1 및 제2 방출부와 연결되고, 피처리물의 결함을 검사하는 검사부, 및 박막 증착용 소스를 분사할 수 있도록 챔버부와 연결되는 소스 공급부를 포함하는 처리 장치 및 이에 적용되는 처리 방법으로서, 대기 중에 마련된 피처리물을 검사 및 리페어할 수 있는 처리 장치 및 방법이 제시된다.