PARTICLE MEASURING DEVICE FOR WAFER CARRIER

The present invention relates to a particle measuring device (200) for measuring particles of a wafer carrier (100) and a particle measuring method. The particle measuring device (200) comprises a device body (210), a first sampling module (410), a second sampling module (420), a load port (220), a...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: JEON KWANG SU, NOH TAE YONG, YOO SEOUNG KYO, KIM JUNG DO, CHOI WANG MIN, LEE HYUN WOOK, BANG JU YEON
Format: Patent
Sprache:eng ; kor
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:The present invention relates to a particle measuring device (200) for measuring particles of a wafer carrier (100) and a particle measuring method. The particle measuring device (200) comprises a device body (210), a first sampling module (410), a second sampling module (420), a load port (220), a load port door (230), and a load port opener (240). When the wafer carrier (100) is mounted on a mounting unit (221) of the load port (220), the particle measuring device (200) is configured to be transported to the first sampling module (410), thereby performing accurate particle measurement in a cleaner environment. 본 발명은 웨이퍼캐리어(100)의 파티클을 측정하기 위한 파티클 측정 장치(200)에 있어서, 장치 본체(210), 제1샘플링모듈(410) 및 제2샘플링모듈(420), 로드포트(220), 로드포트 도어(230), 로드포트 오프너(240)를 포함하되, 상기 로드포트(220)의 안착부(221) 상에 웨이퍼캐리어(100)가 장착되면 상기 제1샘플링모듈(410)까지 반송하도록 구성되어, 보다 청정한 환경에서 정확한 파티클 측정이 이루어질 수 있는 파티클 측정 장치 및 파티클 측정 방법에 관한 것이다.