Repair method for pin-hole and intrusion defects of anti-fouling photomask

The present invention relates to a method of repairing a pattern loss defect of an antifouling coating photomask, and more particularly, to a process method in which a pattern loss defect of an antifouling coating photomask used in a contact or proximity photolithography process is effectively repai...

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Bibliographische Detailangaben
Hauptverfasser:	PARK CHAE RI, KWON AH HYUN, YANG MYUNG SEOK, PARK JUNG CHUL, IN JANG SIK, SONG HYOUNG CHAN, JIN BYEONG KYOU
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The present invention relates to a method of repairing a pattern loss defect of an antifouling coating photomask, and more particularly, to a process method in which a pattern loss defect of an antifouling coating photomask used in a contact or proximity photolithography process is effectively repaired by using an existing repair facility, which is widely used in a photomask process, without using a separate expensive facility, so that a yield of the antifouling coating photomask is improved, and antifouling properties at a defect repair area are intactly maintained. In addition, the present invention relates to a repair process technology capable of improving low adhesion of a conventional ink-based repair method incidentally. The method of repairing the pattern loss defect of the antifouling coating photomask includes: detecting the pattern loss defect; removing an antifouling coating layer; repairing a pattern loss defect portion; reforming the antifouling coating layer; and cleaning the photomask. 본 발명은 방오코팅 포토마스크의 패턴 유실 결함의 수리 방법에 관한 것으로, 더욱 상세하게는 접촉 또는 근접식 포토리소그래피 공정에 사용하는 방오코팅 포토마스크의 패턴 유실 결함을 별도의 고가 설비가 아닌 기존 포토마스크 공정에서 널리 사용되는 수리 설비를 이용하여 효과적으로 패턴 유실 결함을 수리함으로써, 방오코팅 포토마스크의 수율 향상 및 결함 수리부위의 방오 특성을 그대로 유지할 수 있는 공정 방법이며, 또한 부수적으로 종래의 잉크기반 수리 방법의 낮은 밀착성을 개선할 수 있는 수리 공정 기술에 관한 것이다.