METHOD OF FORMING SOLID PATTERN FOR LENS COVER USING HIGH REFRACTIVE INDEX MATERIAL
The present invention comprises: (a) a step of applying a positive or negative photoresist composition on a substrate to form a photoresist layer; (b) a step of drying the photoresist layer; (c) a step of irradiating ultraviolet rays after bringing the dried photoresist layer in contact with an expo...
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| creator | PAEK SINHYE JUNG ILHO PARK CHANSEOK CHOI GWANG YEOB |
| description | The present invention comprises: (a) a step of applying a positive or negative photoresist composition on a substrate to form a photoresist layer; (b) a step of drying the photoresist layer; (c) a step of irradiating ultraviolet rays after bringing the dried photoresist layer in contact with an exposure mask to perform exposure; and (d) a step of developing the exposed photoresist layer to form a pattern layer. The method for forming a three-dimensional pattern for a lens cover according to the present invention can not only have excellent visibility and a three-dimensional effect by configuring a refractive index of the pattern layer different from the substrate, but can also omit a step of forming a reflective layer, thereby reducing manufacturing processes and costs.
본 발명은 (a) 기판 상에 포지티브형 또는 네거티브형 포토레지스트 조성물을 도포하여 포토레지스트층을 형성하는 단계, (b) 상기 포토레지스트층을 건조하는 단계, (c) 상기 건조된 포토레지스트층에 노광 마스크를 접촉시킨 후, 자외선을 조사하여 노광하는 단계, 및 (d) 상기 노광된 포토레지스트층을 현상하여 패턴층을 형성하는 단계를 포함한다. 본 발명에 따른 렌즈 커버용 입체적 패턴 형성방법은 패턴층의 굴절률을 기판과 상이하게 구성함으로써 시인성 및 입체감이 매우 우수할 뿐 아니라 반사층을 형성하는 단계의 생략이 가능하여 제조공정 및 비용을 절감할 수 있다. |
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본 발명은 (a) 기판 상에 포지티브형 또는 네거티브형 포토레지스트 조성물을 도포하여 포토레지스트층을 형성하는 단계, (b) 상기 포토레지스트층을 건조하는 단계, (c) 상기 건조된 포토레지스트층에 노광 마스크를 접촉시킨 후, 자외선을 조사하여 노광하는 단계, 및 (d) 상기 노광된 포토레지스트층을 현상하여 패턴층을 형성하는 단계를 포함한다. 본 발명에 따른 렌즈 커버용 입체적 패턴 형성방법은 패턴층의 굴절률을 기판과 상이하게 구성함으로써 시인성 및 입체감이 매우 우수할 뿐 아니라 반사층을 형성하는 단계의 생략이 가능하여 제조공정 및 비용을 절감할 수 있다.</description><language>eng ; kor</language><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; PHYSICS</subject><creationdate>2019</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190918&DB=EPODOC&CC=KR&NR=102022389B1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190918&DB=EPODOC&CC=KR&NR=102022389B1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>PAEK SINHYE</creatorcontrib><creatorcontrib>JUNG ILHO</creatorcontrib><creatorcontrib>PARK CHANSEOK</creatorcontrib><creatorcontrib>CHOI GWANG YEOB</creatorcontrib><title>METHOD OF FORMING SOLID PATTERN FOR LENS COVER USING HIGH REFRACTIVE INDEX MATERIAL</title><description>The present invention comprises: (a) a step of applying a positive or negative photoresist composition on a substrate to form a photoresist layer; (b) a step of drying the photoresist layer; (c) a step of irradiating ultraviolet rays after bringing the dried photoresist layer in contact with an exposure mask to perform exposure; and (d) a step of developing the exposed photoresist layer to form a pattern layer. The method for forming a three-dimensional pattern for a lens cover according to the present invention can not only have excellent visibility and a three-dimensional effect by configuring a refractive index of the pattern layer different from the substrate, but can also omit a step of forming a reflective layer, thereby reducing manufacturing processes and costs.
본 발명은 (a) 기판 상에 포지티브형 또는 네거티브형 포토레지스트 조성물을 도포하여 포토레지스트층을 형성하는 단계, (b) 상기 포토레지스트층을 건조하는 단계, (c) 상기 건조된 포토레지스트층에 노광 마스크를 접촉시킨 후, 자외선을 조사하여 노광하는 단계, 및 (d) 상기 노광된 포토레지스트층을 현상하여 패턴층을 형성하는 단계를 포함한다. 본 발명에 따른 렌즈 커버용 입체적 패턴 형성방법은 패턴층의 굴절률을 기판과 상이하게 구성함으로써 시인성 및 입체감이 매우 우수할 뿐 아니라 반사층을 형성하는 단계의 생략이 가능하여 제조공정 및 비용을 절감할 수 있다.</description><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2019</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNi7sKwjAUQLs4iPoPF5yFNl10TJObJpiH3KTFrRSJk2ih_j9a8AOcDhzOWRfRYdJBQlCgAjnjW4jBGgkXnhKSXyxY9BFE6JGgi0uiTauBUBEXyfQIxku8guPfw3C7LVb38THn3Y-bYq8wCX3I02vI8zTe8jO_hzNVJSsZq4-npqnq_6oPpMswpQ</recordid><startdate>20190918</startdate><enddate>20190918</enddate><creator>PAEK SINHYE</creator><creator>JUNG ILHO</creator><creator>PARK CHANSEOK</creator><creator>CHOI GWANG YEOB</creator><scope>EVB</scope></search><sort><creationdate>20190918</creationdate><title>METHOD OF FORMING SOLID PATTERN FOR LENS COVER USING HIGH REFRACTIVE INDEX MATERIAL</title><author>PAEK SINHYE ; JUNG ILHO ; PARK CHANSEOK ; CHOI GWANG YEOB</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR102022389BB13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2019</creationdate><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>PAEK SINHYE</creatorcontrib><creatorcontrib>JUNG ILHO</creatorcontrib><creatorcontrib>PARK CHANSEOK</creatorcontrib><creatorcontrib>CHOI GWANG YEOB</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>PAEK SINHYE</au><au>JUNG ILHO</au><au>PARK CHANSEOK</au><au>CHOI GWANG YEOB</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METHOD OF FORMING SOLID PATTERN FOR LENS COVER USING HIGH REFRACTIVE INDEX MATERIAL</title><date>2019-09-18</date><risdate>2019</risdate><abstract>The present invention comprises: (a) a step of applying a positive or negative photoresist composition on a substrate to form a photoresist layer; (b) a step of drying the photoresist layer; (c) a step of irradiating ultraviolet rays after bringing the dried photoresist layer in contact with an exposure mask to perform exposure; and (d) a step of developing the exposed photoresist layer to form a pattern layer. The method for forming a three-dimensional pattern for a lens cover according to the present invention can not only have excellent visibility and a three-dimensional effect by configuring a refractive index of the pattern layer different from the substrate, but can also omit a step of forming a reflective layer, thereby reducing manufacturing processes and costs.
본 발명은 (a) 기판 상에 포지티브형 또는 네거티브형 포토레지스트 조성물을 도포하여 포토레지스트층을 형성하는 단계, (b) 상기 포토레지스트층을 건조하는 단계, (c) 상기 건조된 포토레지스트층에 노광 마스크를 접촉시킨 후, 자외선을 조사하여 노광하는 단계, 및 (d) 상기 노광된 포토레지스트층을 현상하여 패턴층을 형성하는 단계를 포함한다. 본 발명에 따른 렌즈 커버용 입체적 패턴 형성방법은 패턴층의 굴절률을 기판과 상이하게 구성함으로써 시인성 및 입체감이 매우 우수할 뿐 아니라 반사층을 형성하는 단계의 생략이 가능하여 제조공정 및 비용을 절감할 수 있다.</abstract><oa>free_for_read</oa></addata></record> |
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| title | METHOD OF FORMING SOLID PATTERN FOR LENS COVER USING HIGH REFRACTIVE INDEX MATERIAL |
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