METHOD OF FORMING SOLID PATTERN FOR LENS COVER USING HIGH REFRACTIVE INDEX MATERIAL

The present invention comprises: (a) a step of applying a positive or negative photoresist composition on a substrate to form a photoresist layer; (b) a step of drying the photoresist layer; (c) a step of irradiating ultraviolet rays after bringing the dried photoresist layer in contact with an expo...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: PAEK SINHYE, JUNG ILHO, PARK CHANSEOK, CHOI GWANG YEOB
Format: Patent
Sprache:eng ; kor
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Beschreibung
Zusammenfassung:The present invention comprises: (a) a step of applying a positive or negative photoresist composition on a substrate to form a photoresist layer; (b) a step of drying the photoresist layer; (c) a step of irradiating ultraviolet rays after bringing the dried photoresist layer in contact with an exposure mask to perform exposure; and (d) a step of developing the exposed photoresist layer to form a pattern layer. The method for forming a three-dimensional pattern for a lens cover according to the present invention can not only have excellent visibility and a three-dimensional effect by configuring a refractive index of the pattern layer different from the substrate, but can also omit a step of forming a reflective layer, thereby reducing manufacturing processes and costs. 본 발명은 (a) 기판 상에 포지티브형 또는 네거티브형 포토레지스트 조성물을 도포하여 포토레지스트층을 형성하는 단계, (b) 상기 포토레지스트층을 건조하는 단계, (c) 상기 건조된 포토레지스트층에 노광 마스크를 접촉시킨 후, 자외선을 조사하여 노광하는 단계, 및 (d) 상기 노광된 포토레지스트층을 현상하여 패턴층을 형성하는 단계를 포함한다. 본 발명에 따른 렌즈 커버용 입체적 패턴 형성방법은 패턴층의 굴절률을 기판과 상이하게 구성함으로써 시인성 및 입체감이 매우 우수할 뿐 아니라 반사층을 형성하는 단계의 생략이 가능하여 제조공정 및 비용을 절감할 수 있다.