Wafer Processing Apparatus Having Particle Sensor

According to the present invention, provided is a wafer processing apparatus having a particle detecting sensor, which comprises: a wafer transfer unit holding a wafer and transferring the same within a processing area that a wafer processing process is performed; and a particle detecting sensor dis...

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Bibliographische Detailangaben
Hauptverfasser: HONG SOON SUK, KIM, DONG JU, HWANG, MYUNG HWAN
Format: Patent
Sprache:eng ; kor
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