ECO-FREINDLY PHOTOMASK FOR IMPROVING PHOTOLITHOGRAPHY YIELD VIA EXCELLENT CLEANING EASINESS AND MANUFACTURING METHOD THEREOF

The present invention relates to a photomask and to a manufacturing method thereof, and more particularly, in the photomask used in contact or proximity photolithography processes, by forming an anti-fouling coating film, unlike conventional photomasks, adsorption of foreign matters and photoresist...

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Bibliographische Detailangaben
Hauptverfasser:	YANG DAE YEOL, KWON AH HYUN, PARK JUNG CHUL, IN JANG SIK, SONG HYOUNG CHAN, JIN BYEONG KYOU
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	The present invention relates to a photomask and to a manufacturing method thereof, and more particularly, in the photomask used in contact or proximity photolithography processes, by forming an anti-fouling coating film, unlike conventional photomasks, adsorption of foreign matters and photoresist residues adsorbed during processing or storage is prevented, and the adsorbed foreign matters are cleaned by using general clean room wipers, not existing chemicals to provide a function of easy removal, and at the time, by using a highly permeable antifouling functional material, the cleaning easiness is excellent to improve photolithography yield. 본 발명은 포토마스크 및 그 제조방법에 관한 것으로, 더욱 상세하게는 접촉 또는 근접식 포토리소그래피 공정에 사용하는 포토마스크에 있어서 방오 코팅막을 형성시켜 줌으로써, 종래의 포토마스크와는 달리 공정 또는 보관 중 흡착하는 이물, 포토레지스트 잔여물의 흡착을 방지하고 흡착된 이물을 기존의 화학약품을 이용한 세정이 아닌 일반 클린룸용 와이퍼를 이용하여 손쉽게 제거할 수 있는 기능을 부여하고 이때 고투과성의 방오 기능성 물질을 사용함으로써 세정 용이성이 우수하여 포토리소그래피 수율을 향상시킬 수 있는 친환경 포토마스크 및 그의 제조 기술에 관한 것이다.