Composition for making abrasive pad resin

The present invention relates to a composition for producing an abrasive pad resin for realizing a continuous polishing performance. The composition for producing an abrasive pad resin according to the present invention exhibits appropriate hardness so as to maintain the initial polishing performanc...

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Bibliographische Detailangaben
Hauptverfasser:	SEO, YOUNG GIL, MOON, DEOG JU, JO, SEONG WOOK
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	CHEMISTRY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS GRINDING MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS PERFORMING OPERATIONS POLISHING THEIR PREPARATION OR CHEMICAL WORKING-UP TOOLS FOR GRINDING, BUFFING, OR SHARPENING TRANSPORTING
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Beschreibung
Zusammenfassung:	The present invention relates to a composition for producing an abrasive pad resin for realizing a continuous polishing performance. The composition for producing an abrasive pad resin according to the present invention exhibits appropriate hardness so as to maintain the initial polishing performance of a polishing process while exhibiting excellent polishing efficiency at the same time. The composition contains an acrylate monomer, and 1 to 50 parts by weight of epoxy acrylate oligomer based on 100 parts by weight of the acrylate monomer. 본 발명은 지속적인 연마성능을 구현하기 위한 연마 패드 수지 제조용 조성물에 관한 것이다. 본 발명에 따른 연마 패드 수지 제조용 조성물은 적절한 경도를 나타내어 연마공정 초기 연마 성능을 지속적으로 유지하면서도 동시에 연마 효율이 우수한 효과를 나타낸다.