APPARATUS FOR PROCESSING SUBSTRATE
A substrate processing apparatus (10) is disclosed. A substrate processing apparatus (10) according to the present invention includes: at least one slot (s) in which at least one substrate (50) is loaded/unloaded; a main body (100) including a chamber (105) providing a substrate processing space; an...
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| Format: | Patent |
| Sprache: | eng ; kor |
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| Zusammenfassung: | A substrate processing apparatus (10) is disclosed. A substrate processing apparatus (10) according to the present invention includes: at least one slot (s) in which at least one substrate (50) is loaded/unloaded; a main body (100) including a chamber (105) providing a substrate processing space; and at least one door (110, 120) configured to open and close the slot (s) and having an air jetting portion (115), wherein when the door (110, 120) is positioned such that the slot (s) is opened, air is sprayed from the air jetting portion (115) so as to form an air curtain in front of the slot (s).
기판처리 장치(10)가 개시된다. 본 발명에 따른 기판처리 장치(10)는, 적어도 하나의 기판(50)이 로딩/언로딩되는 적어도 하나의 슬롯(s)과, 기판처리 공간을 제공하는 챔버(105)를 포함하는 본체(100), 및 슬롯(s)을 개폐하고, 에어 분사부(115)를 구비하는 적어도 하나의 도어(110, 120)를 포함하며, 슬롯(s)이 개방되도록 도어(110, 120)가 위치하면, 에어 분사부(115)에서 에어(A)를 분사하여 슬롯(s) 전방에 에어 커튼을 형성하는 것을 특징으로 한다. |
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