PLASMA DEVICE

According to the present invention, a plasma device, for uniform plasma process, comprises: a chamber configured to accommodate a processed object which is plasma-processed; and a coil configured to rotate together with a rotation shaft if the rotation shaft prepared in one side of the chamber is ro...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	SUH, KEE WON
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
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