PLASMA DEVICE

According to the present invention, a plasma device, for uniform plasma process, comprises: a chamber configured to accommodate a processed object which is plasma-processed; and a coil configured to rotate together with a rotation shaft if the rotation shaft prepared in one side of the chamber is ro...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser:	SUH, KEE WON
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
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Beschreibung
Zusammenfassung:	According to the present invention, a plasma device, for uniform plasma process, comprises: a chamber configured to accommodate a processed object which is plasma-processed; and a coil configured to rotate together with a rotation shaft if the rotation shaft prepared in one side of the chamber is rotated. A first coil and a second coil having different rotation radii can be prepared at different locations in a z-axis in the antenna coil. 본 발명의 플라즈마 장치는 플라즈마 가공되는 가공물이 수용되는 챔버; 및 상기 챔버의 일측에 마련된 회전축이 회전하면, 상기 회전축과 함께 회전하는 안테나 코일;을 포함하고, 상기 안테나 코일에는 회전 반경이 다른 제1 코일과 제2 코일이 z축으로 서로 다른 위치에 마련될 수 있다.