Method of detecting deposition status of device and system thereof
The present invention relates to a method for determining the deposition status of a device and a system thereof. More specifically, the present invention relates to the method and the system for determining the deposition status of the device, which can simply determine the deposition status by ima...
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| Format: | Patent |
| Sprache: | eng ; kor |
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| Zusammenfassung: | The present invention relates to a method for determining the deposition status of a device and a system thereof. More specifically, the present invention relates to the method and the system for determining the deposition status of the device, which can simply determine the deposition status by image processing after attaching the device by using a film to a cooling chuck located in a vacuum chamber and performing a deposition process.
본 발명은 증착 상태 판단 방법 및 그 시스템에 관한 것으로, 보다 구체적으로는 진공 챔버 내에 위치하는 쿨링 척 상에 필름을 이용하여 소자를 부착한 후, 증착 공정을 수행한 이후에, 증착 상태의 양부를 영상처리를 통해 간단하게 판별할 할 수 있는 소자의 증착 상태 판단 방법 및 그 시스템에 관한 것이다. |
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