CHEMICAL MIXING APPARATUS FOR MANUFACTURING SEMICONDUCTOR

Disclosed is a mixing apparatus of a cleaning apparatus, which removes impurities on a wafer surface in a wafer manufacturing process. The present invention provides a liquid chemical mixing apparatus for manufacturing a semiconductor, mixing a plurality of supplied liquid chemicals in a liquid chem...

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Bibliographische Detailangaben
Hauptverfasser:	HONG, SA MUN, KIM, CHUL YOUNG, LEE, SUNG ROK, KIM, DO HYUN, LEE, KYOUNG JIN, LIM, TEG KYU
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS CLEANING CLEANING IN GENERAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING
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Beschreibung
Zusammenfassung:	Disclosed is a mixing apparatus of a cleaning apparatus, which removes impurities on a wafer surface in a wafer manufacturing process. The present invention provides a liquid chemical mixing apparatus for manufacturing a semiconductor, mixing a plurality of supplied liquid chemicals in a liquid chemical mixer and providing the same to clean a surface of a wafer. The liquid chemical mixing apparatus further includes a preparatory mixer preparatorily mixing a supplied sulfuric acid liquid chemical and supplying the same to the liquid chemical mixer. 반도체 웨이퍼 제조 공정에 있어서 웨이퍼 표면의 불순물을 제거하는 세정 장치의 혼합 장치를 개시한다. 본 발명은 공급되는 복수의 약액을 약액 혼합기에서 혼합하여 웨이퍼의 표면을 세척하는데 제공하는 반도체 제조용 약액 혼합 장치에 있어서, 공급되는 황산 약액을 예비 혼합시켜 상기 약액 혼합기로 공급하는 예비 혼합기를 더 포함하여 이루어진 것을 특징으로 한다.