SCRUBBER FOR PROCESSING WASTE GAS
Disclosed is a scrubber for processing waste gas, capable of removing harmful materials from the waste gas generated in semiconductor and LCD processes. According to one aspect of the present invention, provided is the scrubber for processing the waste gas which includes a burner part which includes...
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| Format: | Patent |
| Sprache: | eng ; kor |
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| Zusammenfassung: | Disclosed is a scrubber for processing waste gas, capable of removing harmful materials from the waste gas generated in semiconductor and LCD processes. According to one aspect of the present invention, provided is the scrubber for processing the waste gas which includes a burner part which includes a burning chamber and a burner and pyrolyzes the waste gas by burning the waste gas generated in the semiconductor process, a water processing unit which includes a spray nozzle and sprays cooling water to the waste gas via the burner part, and a dehumidifying unit which dehumidifies water included in the waste gas by cooling the waste gas via the water processing unit at a temperature of the dew point or less.
반도체, LCD 공정 등에서 발생되는 폐가스로부터 유해물질을 제거하기 위한 폐가스 처리용 스크러버가 개시된다. 본 발명의 일 측면에 따르면, 버닝챔버 및 버너를 구비하고, 반도체 공정에서 발생된 폐가스를 연소시켜 열분해하는 버너부; 분사노즐을 구비하고, 상기 버너부를 거친 폐가스에 냉각수를 분사하는 수처리부; 및 상기 수처리부를 거친 폐가스를 이슬점 이하의 온도로 냉각시켜 상기 폐가스에 함유된 수분을 제거하는 제습부;를 포함하는 폐가스 처리용 스크러버가 제공될 수 있다. |
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