PHASE SHIFT BLANK MASK AND PHOTOMASK

The present invention relates to a phase shift blank mask that includes a light blocking film and a phase shift film on a transparent substrate thereof. The light blocking film is made of a chrome-tin (Cr-Sn) compound including chrome (Cr) and tin (Sn) to make thickness of the light blocking film th...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	JEONG, SEE JUN, JANG, KYU JIN, KIM, CHANG JUN, SHIN, CHEOL, YANG, CHUL KYU, LEE, JONG HWA, KANG, GEUNG WON, NAM, KEE SOO
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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