METHODS FOR FABRICATION OF STABLE ULTRA-LOW REFLECTIVIVE SURFACE AND THE ULTRA-LOW REFLECTIVIVE SURFACE ITSELF

According to an embodiment of the present invention, a method of manufacturing a low-reflection surface body (30) includes a first step of preparing material (10) including a column structure (11) at a surface; a second step of preparing aluminum surface-material (20) by processing the column struct...

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Bibliographische Detailangaben
Hauptverfasser: KO, TAE JUN, MOON, MYOUNG WOON, YU, EU SUN, LEE, HEON JU, KIM, SEONG JIN, OH, KYU HWAN, KIM, SEUNG CHUL
Format: Patent
Sprache:eng ; kor
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Zusammenfassung:According to an embodiment of the present invention, a method of manufacturing a low-reflection surface body (30) includes a first step of preparing material (10) including a column structure (11) at a surface; a second step of preparing aluminum surface-material (20) by processing the column structure (11) to have an aluminum film (21); and a third step of oxidizing the aluminum surface-material (20) to form a nanoflake layer (31) to manufacture a low-reflection surface body (30) having a dual projection structure (33). The method of manufacturing the low-reflection surface body (30) totally and internally reflects and absorbs wavelengths in ranges of visible ray and infrared ray regions to provide the low-reflection surface body (30) which is a surface able to remarkably reduce reflection rate and can be applied in a surface of a photovoltaic element or surface processing of various displays by a simple, low-cost, and eco-friendly process.