SUBSTRATE PROCESSING METHOD

The present invention relates to a substrate processing method comprising the steps of changing process time and rotational speed of a substrate according to a change of a process condition to set and store the process time and rotational speed; calculating the number of rotations of the substrate b...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	JEONG, WOONG SHIK
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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