HEAT TREATMENT CHAMBER AND METHOD OF SUBSTRATE WITH EASY MAINTENANCE, AND HEAT TREATMENT APPARATUS OF SUBSTRATE HAVING THE SAME

Disclosed are a substrate heat treatment chamber with easy maintenance and a method, and a substrate heat treatment apparatus having the same. A substrate heat treatment chamber according to the present invention includes an upper and a lower operation plate housing which are respectively detachable from a heat treatment chamber housing. The upper and the lower operation plate housing includes a heater unit which comprises lamp heaters which are detachable along cut-off parts which are formed at regular intervals; and a lift pin unit which comprises lift pins for mounting a substrate which are respectively provided to the upper part of the lower operation plate housing. The heat treatment housing and the upper and the lower operation plate housing form a heat treatment space for heat-treating the substrate and perform maintenance operations after the lower operation plate housing is detached from the heat treatment chamber housing when the maintenance of the lamp heater is required.