HEATING APPARATUS FOR HEATER OF SUBSTRATE PROCESSING APPARATUS

HEATING APPARATUS FOR HEATER OF SUBSTRATE PROCESSING APPARATUS

PURPOSE: A heating apparatus for a heater of a substrate processing apparatus are provided to improve the temperature evenness of a heater by partly heating the heater through controlling the radiation angle of heat applied to the lower part of the heater. CONSTITUTION: A chamber wall(3) forms a rea...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
1. Verfasser: SOHN, HONG JUN
Format: Patent
Sprache:eng ; kor
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:PURPOSE: A heating apparatus for a heater of a substrate processing apparatus are provided to improve the temperature evenness of a heater by partly heating the heater through controlling the radiation angle of heat applied to the lower part of the heater. CONSTITUTION: A chamber wall(3) forms a reaction space. A heater block(2) is installed within the chamber wall. A lamp assembly(10) is installed in the lower part of the outside of the chamber wall. The lamp assembly heats the lower part of the heater block. The lamp assembly is comprised of a lamp, a motor, and a bracket.