APPARATUS FOR FORMING A PATTERN ON A SUBSTRATE AND METHOD OF FORMING A PATTERN USING THE SAME APPARATUS

PURPOSE: An apparatus and a method for forming a pattern are provided to increase the number of substrates, which are possible to be processed at a time, since the inner loading spaced of a loader and an unloader are expanded. CONSTITUTION: An apparatus(1000) for forming a pattern comprises a proces...

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Bibliographische Detailangaben
Hauptverfasser: LEE, KYOON WON, LEE, KYU HONG, MAENG, JI YE, KIM, SUNG IHL
Format: Patent
Sprache:eng ; kor
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Zusammenfassung:PURPOSE: An apparatus and a method for forming a pattern are provided to increase the number of substrates, which are possible to be processed at a time, since the inner loading spaced of a loader and an unloader are expanded. CONSTITUTION: An apparatus(1000) for forming a pattern comprises a processing unit and a substrate unloader(700). The processing unit processes a substrate so that neighboring pattern traces are spaced by the transfer pitch of the substrate. The processing unit comprises a support(100), a substrate transfer unit(200), a pair of laser generators(300) and a laser guiding unit(400). A support bridge comprises a pair of legs and a top plate. The top plate is fixed to the tops of the legs. The top plate crosses a support plate along a width. A rotating member is rotatably fixed to the center of the top plate. The substrate unloader forms a pattern on the surface of the substrate through a inline process.