SUBSTRATE PROCESSING APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD

Disclosed is a substrate processing apparatus, including: a processing container; a gas supply section to supply a desired processing gas to the processing container; a gas exhaust section to exhaust a surplus of the processing gas from the processing container; a substrate placing member to place a...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	MAMORU, MURAHASHI, SUSUMU, DAKATA
Format:	Patent
Sprache:	eng
Schlagworte:	ARTIFICIAL STONE BUILDING BUILDING MATERIALS CEMENTS CERAMICS CHEMISTRY COMBINED OPERATIONS COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS CONCRETE FIXED CONSTRUCTIONS LIME, MAGNESIA MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR METALLURGY OTHER WORKING OF METAL PERFORMING OPERATIONS REFRACTORIES SLAG STRUCTURAL ELEMENTS TRANSPORTING TREATMENT OF NATURAL STONE UNIVERSAL MACHINE TOOLS
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Beschreibung
Zusammenfassung:	Disclosed is a substrate processing apparatus, including: a processing container; a gas supply section to supply a desired processing gas to the processing container; a gas exhaust section to exhaust a surplus of the processing gas from the processing container; a substrate placing member to place a plurality of substrates thereon in a stacked state in the processing container; and an electrode, to which high frequency electric power is applied, to generate plasma for exciting the processing gas, the electrode including two thin and long linear sections disposed in parallel and a short-circuit section to electrically short-circuit one ends of the linear sections, and the linear sections extending beside the substrates in a direction substantially perpendicular to main faces of the substrates.