ECHANT FOR LAYERS OF COPPER OR COPPER ALLOY

Echant for a copper or copper alloy film is provided to ensure excellent profile property which has taper less than 60 degree and CD loss of 1 micron or less and good pattern directivity, to prevent the damage of glass plate which is a substrate and to secure long life time. Echant for a copper or c...

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Bibliographische Detailangaben
Hauptverfasser: PARK, HYO JUN, JEON, HYUNG JIN, WOO, HYUN, CHEUN, IL KUN
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Echant for a copper or copper alloy film is provided to ensure excellent profile property which has taper less than 60 degree and CD loss of 1 micron or less and good pattern directivity, to prevent the damage of glass plate which is a substrate and to secure long life time. Echant for a copper or copper alloy film comprises hydrogen peroxide 15~40 wt%, at least one organic acid 1~20 wt% selected from the group consisting of carboxy acid and amino acid, sulfate or fluorate 1~5 wt%, chelating agent 0.01~3 wt%, fluorosurfactant 0.0001~1 wt% and the remaining amount of water.