ECHANT FOR LAYERS OF COPPER OR COPPER ALLOY
Echant for a copper or copper alloy film is provided to ensure excellent profile property which has taper less than 60 degree and CD loss of 1 micron or less and good pattern directivity, to prevent the damage of glass plate which is a substrate and to secure long life time. Echant for a copper or c...
Gespeichert in:
Hauptverfasser: | , , , |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | Echant for a copper or copper alloy film is provided to ensure excellent profile property which has taper less than 60 degree and CD loss of 1 micron or less and good pattern directivity, to prevent the damage of glass plate which is a substrate and to secure long life time. Echant for a copper or copper alloy film comprises hydrogen peroxide 15~40 wt%, at least one organic acid 1~20 wt% selected from the group consisting of carboxy acid and amino acid, sulfate or fluorate 1~5 wt%, chelating agent 0.01~3 wt%, fluorosurfactant 0.0001~1 wt% and the remaining amount of water. |
---|