ROLL PATTERING DEVICE

A roll patterning apparatus is provided to align correctly a roll and a mask by moving a supporting plate including the mask and a light source lamp to a stage. A roll(100) as a patterning target is loaded into a chuck(10). A roll motor(20) is formed to rotate the roll. A supporting plate(30) is for...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	SHIN, KWAN WOO, KIM, YONG TAE, PARK, SUNG UN, BYUN, CHAY WAN
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A roll patterning apparatus is provided to align correctly a roll and a mask by moving a supporting plate including the mask and a light source lamp to a stage. A roll(100) as a patterning target is loaded into a chuck(10). A roll motor(20) is formed to rotate the roll. A supporting plate(30) is formed at one side of the roll to support a mask(200). A light source lamp(300) is installed at the supporting plate. The light source lamp is installed at an opposite side of the roll on the basis of the mask. A stage(40) is formed to move the mask in x, y, and z axis directions with respect to the roll. The chuck includes a first and second chucks(11,12) which are positioned at both ends of a longitudinal direction of the roll.