TREATMENT METHOD FOR WASTE ORGANIC SOLVENT CONTAINING PHOTORESIST COMPONENT

A treatment method of a waste organic solvent containing photoresist components is provided to minimize process troubles due to the photoresist components and increase the recovery ratio of organic solvent in a subsequent process of regenerating the waste organic solvent by efficiently removing the photoresist components contained in the waste organic solvent generated in the display fabricating process. A treatment method of a waste organic solvent comprises the steps of: (i) adding a solvent of which a solubility to the photoresist is lower than that of an organic solvent to a waste organic solvent containing photoresist components in the amount of 0.1 to 10 weight parts relative to 1 weight part of the waste organic solvent, thereby precipitating the photoresist components from the waste organic solvent; and (ii) separating and removing precipitated solids from the waste organic solvent. The solvent has a solubility to the photoresist of less than 10 mg/ml at 25 deg.C. The separation of the solids from the waste organic solvent in the step(ii) is performed by a gravitational settling process, a filtering process, or a centrifuging process. The treatment method further comprises the step of purifying the waste organic solvent having the solids removed therefrom. Further, the purifying step is performed by distillation.