EXPOSURE DEVICE WITH COOLING APPARATUS

Exposure equipment with a cooling apparatus is provided to adjust the temperature in a chamber by supplying and circulating water of low temperature to cooling pipes installed in both sides of the chamber. A reflection plate for reflecting the light generated from a lamp downward is installed in a c...

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Bibliographische Detailangaben
Hauptverfasser:	SEO, HWA IL, KANG, HEUNG SEOK, LEE, WOO YOUNG, KIM, JONG WON, PARK, YONG KYU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	Exposure equipment with a cooling apparatus is provided to adjust the temperature in a chamber by supplying and circulating water of low temperature to cooling pipes installed in both sides of the chamber. A reflection plate for reflecting the light generated from a lamp downward is installed in a chamber. A pair of first and second reflection mirrors reflect the light transferred from the reflection plate in both lateral directions. A pair of lenses collect the light transferred as a dispersed state from the second reflection mirror to transfer the collected light to the edge of a substrate. Cooling pipes(150a,150b) uniformly maintains the inner temperature of the chamber increased by the lamp, installed in both lateral surfaces of the chamber. A sub chamber can guarantee the path of the parallel light transferred to the first reflection mirror through the reflection plate, installed between the lamp and the first reflection mirror.