APPARATUS AND METHOD FOR TREATING SUBSTRATE

A substrate processing apparatus is provided to reduce the costs for fabricating an apparatus for performing a coating process by including a first coating part for coating photoresist used in fabricating a color filter and a second coating part for coating photoresist used in fabricating a thin film transistor wherein the first and second coating parts are included in one apparatus. A substrate is loaded into a substrate loading part(110). The substrate is unloaded by a substrate unloading part(150). A coating part(130) coats photoresist on the surface of the substrate, installed between the substrate loading part and the substrate unloading part. The coating part include a first coating unit(132) for coating first photoresist and a second coating unit(134) for coating second photoresist different from the first photoresist. A substrate aligning part(120) aligns the substrate, disposed between the substrate loading part and the coating part. A substrate drying part(140) dries the substrate, disposed between the coating part and the substrate unloading part. The substrate loading part, the substrate aligning part, the coating part, the substrate drying part and the substrate unloading part are sequentially disposed in a line.