PHOTOSENSITIVE POLYMER AND PHOTORESIST COMPOSITION INCLUDING THE SAME FOR EXTREME UV AND DEEP UV

A photosensitive polymer is provided to improve the line width stability of a pattern upon development after the exposure to an exposure source of extreme UV and deep UV rays. A photosensitive polymer for extreme UV and deep UV rays comprises repeating units represented by the following formula 1. I...

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Bibliographische Detailangaben
Hauptverfasser:	KIM, DEOG BAE, KIM, JAE HYUN
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	A photosensitive polymer is provided to improve the line width stability of a pattern upon development after the exposure to an exposure source of extreme UV and deep UV rays. A photosensitive polymer for extreme UV and deep UV rays comprises repeating units represented by the following formula 1. In formula 1, each of R1 and R1' independently represents H, methyl or trifluoromethyl; R2 is a C4-C12 cyclic compound; and R3 is the formula (a), wherein each of Ra and Rb independently represents a C1-C10 alkyl, C6-C10 aryl or C7-C12 arylalkyl, or Ra and Rb are linked to each other to form a ring, and each of a and b is a mol% of each repeating unit based on the total repeating units forming the photosensitive polymer, a is 1-99 mol% and b is 1-99 mol%.