POLYMER RESIN COMPOSITION, METHOD OF FORMING A PATTERN USING THE SAME AND METHOD OF MANUFACTURING A CAPACITOR USING THE SAME

Provided are a polymer resin composition, a method for forming a blocking pattern by using the composition to inhibit the generation of void at an aperture and to prevent the separation or removal of a lower electrode, and a method for forming a capacitor lower electrode by using the composition. A polymer resin composition comprises 75-93 wt% of a copolymer which comprises a benzyl methacrylate monomer, a methacrylic acid monomer and a hydroxyethyl methacrylate monomer; 1-7 wt% of a crosslinking agent; 0.01-0.5 wt% of a thermal acid generator; 0.01-1 wt% of a photoacid generator; 0.00001-0.001 wt% of an organic base; and the balance of a solvent. Preferably the crosslinking agent is a melamine-based resin; and the thermal acid generator comprises at least one compound represented by formulae 1, 2, 3, 4 and 5.