SPIN COATING APPARATUS

A spin coating apparatus is provided to prevent a pipeline from being clogged due to the solid phase solvent exhausted from photoresist by using an improved exhausting mechanism. A spin coating apparatus includes a spin support unit, a photoresist supply unit, a waste solution storing unit and a coo...

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Bibliographische Detailangaben
1. Verfasser:	SON, JONG HOON
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPARATUS SPECIALLY ADAPTED THEREFOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HAND TOOLS HOLOGRAPHY MANIPULATORS MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PORTABLE POWER-DRIVEN TOOLS PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL SEMICONDUCTOR DEVICES SPRAYING OR ATOMISING IN GENERAL TOOLS OR BENCH DEVICES NOT OTHERWISE PROVIDED FOR, FORFASTENING, CONNECTING, DISENGAGING OR HOLDING TRANSPORTING
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Beschreibung
Zusammenfassung:	A spin coating apparatus is provided to prevent a pipeline from being clogged due to the solid phase solvent exhausted from photoresist by using an improved exhausting mechanism. A spin coating apparatus includes a spin support unit, a photoresist supply unit, a waste solution storing unit and a cooling unit. The spin support unit(102) is installed in a process chamber in order to fix a substrate. The photoresist supply unit(113) is installed at one side of the spin support unit in order to supply a photoresist solution to the substrate. The waste solution storing unit(109) is used for storing a waste photoresist solution. The cooling unit(103) is used for cooling and exhausting a solvent component of the waste photoresist solution.