SINGLE ELECTRON TRANSISTOR FORMED BY POROUS SILICON AND FABRICATING METHOD THEREOF

PURPOSE: A single electron transistor and a fabricating method thereof are provided to improve reproducibility and homogeneity of a size of an island by using porous silicon as the island of the single electron transistor. CONSTITUTION: A porous silicon layer(40) including apertures having diameters less than 5nm is formed on a substrate(10). A source(20) and a drain(30) are formed on both sides of the porous silicon layer by using a metal. An insulating layer(50) is formed on the porous silicon layer by using an oxide. A gate(60) is formed on the insulating layer. The substrate is formed with an SOI substrate. A thickness of the porous layer is less than 10nm.