METHOD FOR FORMING ISOLATION LAYER OF SEMICONDUCTOR DEVICE

PURPOSE: A method for forming an isolation layer of a semiconductor device is provided to be capable of improving the yield, characteristic and reliability of the semiconductor device. CONSTITUTION: The first and second insulating layer are sequentially formed on a semiconductor substrate(11). A con...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	PI, SEUNG HO
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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