TEST PATTERN FOR SEMICONDUCTOR
PURPOSE: A semiconductor test pattern is provided to measure correctly electromigration between metal lines by forming various line width on a small area. CONSTITUTION: A multitude of metal lines(1,2,3) are arranged parallel to each other. The metal lanes(1,2,3) have different line width. A couple o...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | PURPOSE: A semiconductor test pattern is provided to measure correctly electromigration between metal lines by forming various line width on a small area. CONSTITUTION: A multitude of metal lines(1,2,3) are arranged parallel to each other. The metal lanes(1,2,3) have different line width. A couple of pad(P) is formed at both ends of the metal line(1,2,3). A bar(N1,N2) connects the metal lines(1,2,3) to each other. Pads(P) of predetermined number area connected to the same direction as the bar(N1.N2). Two or more metal line patterns of the metal lines(1,2,3) are connected by a via contact. The first pattern and the second pattern are formed at both ends of the metal lines(1,2,3). |
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