EFFUSION CELL FOR EPITAXIAL APPARATUS
PURPOSE: An evaporation crucible for an epitaxial apparatus is provided to minimize the contamination of the apparatus and the time required to recover the state. CONSTITUTION: A gate valve is installed between an entrance flange and an adapter flange of a vacuum chamber, and maintains the vacuum in...
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creator | BAEK, MUN CHEOL LEE, HAE GWON SIM, GYU HWAN CHOI, SUNG WOO NAM, KEE SOO |
description | PURPOSE: An evaporation crucible for an epitaxial apparatus is provided to minimize the contamination of the apparatus and the time required to recover the state. CONSTITUTION: A gate valve is installed between an entrance flange and an adapter flange of a vacuum chamber, and maintains the vacuum in the vacuum chamber by being isolated from the external, and is opened/closed to introduce vacuum into the vacuum chamber. An introduction tube comprises a heater providing heat to evaporize a growth material and a supporter supporting the heater. And, a crucible flange(23) is combined with a bottom flange of an adapter by being installed to one end of the introduction tube. And, a fringe tube(25) is extended and shrunken to separate the introduction tube from the vacuum chamber by removing a local vacuum as maintaining the vacuum of the vacuum chamber. |
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fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_KR100270319BB1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>KR100270319BB1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_KR100270319BB13</originalsourceid><addsrcrecordid>eNrjZFB1dXMLDfb091NwdvXxUXDzD1JwDfAMcYzwdPRRcAwIcAxyDAkN5mFgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFicmpeakl8d5BhgYGRuYGxoaWTk6GxsSpAgAqlSQ2</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>EFFUSION CELL FOR EPITAXIAL APPARATUS</title><source>esp@cenet</source><creator>BAEK, MUN CHEOL ; LEE, HAE GWON ; SIM, GYU HWAN ; CHOI, SUNG WOO ; NAM, KEE SOO</creator><creatorcontrib>BAEK, MUN CHEOL ; LEE, HAE GWON ; SIM, GYU HWAN ; CHOI, SUNG WOO ; NAM, KEE SOO</creatorcontrib><description>PURPOSE: An evaporation crucible for an epitaxial apparatus is provided to minimize the contamination of the apparatus and the time required to recover the state. CONSTITUTION: A gate valve is installed between an entrance flange and an adapter flange of a vacuum chamber, and maintains the vacuum in the vacuum chamber by being isolated from the external, and is opened/closed to introduce vacuum into the vacuum chamber. An introduction tube comprises a heater providing heat to evaporize a growth material and a supporter supporting the heater. And, a crucible flange(23) is combined with a bottom flange of an adapter by being installed to one end of the introduction tube. And, a fringe tube(25) is extended and shrunken to separate the introduction tube from the vacuum chamber by removing a local vacuum as maintaining the vacuum of the vacuum chamber.</description><edition>7</edition><language>eng</language><subject>AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE ; APPARATUS THEREFOR ; BASIC ELECTRIC ELEMENTS ; CHEMISTRY ; CRYSTAL GROWTH ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; METALLURGY ; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE ; REFINING BY ZONE-MELTING OF MATERIAL ; SEMICONDUCTOR DEVICES ; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE ; SINGLE-CRYSTAL-GROWTH ; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL</subject><creationdate>2000</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20001016&DB=EPODOC&CC=KR&NR=100270319B1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20001016&DB=EPODOC&CC=KR&NR=100270319B1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>BAEK, MUN CHEOL</creatorcontrib><creatorcontrib>LEE, HAE GWON</creatorcontrib><creatorcontrib>SIM, GYU HWAN</creatorcontrib><creatorcontrib>CHOI, SUNG WOO</creatorcontrib><creatorcontrib>NAM, KEE SOO</creatorcontrib><title>EFFUSION CELL FOR EPITAXIAL APPARATUS</title><description>PURPOSE: An evaporation crucible for an epitaxial apparatus is provided to minimize the contamination of the apparatus and the time required to recover the state. CONSTITUTION: A gate valve is installed between an entrance flange and an adapter flange of a vacuum chamber, and maintains the vacuum in the vacuum chamber by being isolated from the external, and is opened/closed to introduce vacuum into the vacuum chamber. An introduction tube comprises a heater providing heat to evaporize a growth material and a supporter supporting the heater. And, a crucible flange(23) is combined with a bottom flange of an adapter by being installed to one end of the introduction tube. And, a fringe tube(25) is extended and shrunken to separate the introduction tube from the vacuum chamber by removing a local vacuum as maintaining the vacuum of the vacuum chamber.</description><subject>AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE</subject><subject>APPARATUS THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMISTRY</subject><subject>CRYSTAL GROWTH</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>METALLURGY</subject><subject>PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE</subject><subject>REFINING BY ZONE-MELTING OF MATERIAL</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE</subject><subject>SINGLE-CRYSTAL-GROWTH</subject><subject>UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2000</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFB1dXMLDfb091NwdvXxUXDzD1JwDfAMcYzwdPRRcAwIcAxyDAkN5mFgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFicmpeakl8d5BhgYGRuYGxoaWTk6GxsSpAgAqlSQ2</recordid><startdate>20001016</startdate><enddate>20001016</enddate><creator>BAEK, MUN CHEOL</creator><creator>LEE, HAE GWON</creator><creator>SIM, GYU HWAN</creator><creator>CHOI, SUNG WOO</creator><creator>NAM, KEE SOO</creator><scope>EVB</scope></search><sort><creationdate>20001016</creationdate><title>EFFUSION CELL FOR EPITAXIAL APPARATUS</title><author>BAEK, MUN CHEOL ; LEE, HAE GWON ; SIM, GYU HWAN ; CHOI, SUNG WOO ; NAM, KEE SOO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR100270319BB13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2000</creationdate><topic>AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE</topic><topic>APPARATUS THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMISTRY</topic><topic>CRYSTAL GROWTH</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>METALLURGY</topic><topic>PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE</topic><topic>REFINING BY ZONE-MELTING OF MATERIAL</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE</topic><topic>SINGLE-CRYSTAL-GROWTH</topic><topic>UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL</topic><toplevel>online_resources</toplevel><creatorcontrib>BAEK, MUN CHEOL</creatorcontrib><creatorcontrib>LEE, HAE GWON</creatorcontrib><creatorcontrib>SIM, GYU HWAN</creatorcontrib><creatorcontrib>CHOI, SUNG WOO</creatorcontrib><creatorcontrib>NAM, KEE SOO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>BAEK, MUN CHEOL</au><au>LEE, HAE GWON</au><au>SIM, GYU HWAN</au><au>CHOI, SUNG WOO</au><au>NAM, KEE SOO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>EFFUSION CELL FOR EPITAXIAL APPARATUS</title><date>2000-10-16</date><risdate>2000</risdate><abstract>PURPOSE: An evaporation crucible for an epitaxial apparatus is provided to minimize the contamination of the apparatus and the time required to recover the state. CONSTITUTION: A gate valve is installed between an entrance flange and an adapter flange of a vacuum chamber, and maintains the vacuum in the vacuum chamber by being isolated from the external, and is opened/closed to introduce vacuum into the vacuum chamber. An introduction tube comprises a heater providing heat to evaporize a growth material and a supporter supporting the heater. And, a crucible flange(23) is combined with a bottom flange of an adapter by being installed to one end of the introduction tube. And, a fringe tube(25) is extended and shrunken to separate the introduction tube from the vacuum chamber by removing a local vacuum as maintaining the vacuum of the vacuum chamber.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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subjects | AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE APPARATUS THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CRYSTAL GROWTH ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY METALLURGY PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE REFINING BY ZONE-MELTING OF MATERIAL SEMICONDUCTOR DEVICES SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE SINGLE-CRYSTAL-GROWTH UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL |
title | EFFUSION CELL FOR EPITAXIAL APPARATUS |
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