EFFUSION CELL FOR EPITAXIAL APPARATUS

PURPOSE: An evaporation crucible for an epitaxial apparatus is provided to minimize the contamination of the apparatus and the time required to recover the state. CONSTITUTION: A gate valve is installed between an entrance flange and an adapter flange of a vacuum chamber, and maintains the vacuum in...

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Bibliographische Detailangaben
Hauptverfasser:	BAEK, MUN CHEOL, LEE, HAE GWON, SIM, GYU HWAN, CHOI, SUNG WOO, NAM, KEE SOO
Format:	Patent
Sprache:	eng
Schlagworte:	AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE APPARATUS THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CRYSTAL GROWTH ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY METALLURGY PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE REFINING BY ZONE-MELTING OF MATERIAL SEMICONDUCTOR DEVICES SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE SINGLE-CRYSTAL-GROWTH UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL
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Beschreibung
Zusammenfassung:	PURPOSE: An evaporation crucible for an epitaxial apparatus is provided to minimize the contamination of the apparatus and the time required to recover the state. CONSTITUTION: A gate valve is installed between an entrance flange and an adapter flange of a vacuum chamber, and maintains the vacuum in the vacuum chamber by being isolated from the external, and is opened/closed to introduce vacuum into the vacuum chamber. An introduction tube comprises a heater providing heat to evaporize a growth material and a supporter supporting the heater. And, a crucible flange(23) is combined with a bottom flange of an adapter by being installed to one end of the introduction tube. And, a fringe tube(25) is extended and shrunken to separate the introduction tube from the vacuum chamber by removing a local vacuum as maintaining the vacuum of the vacuum chamber.