MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

PURPOSE: A method for manufacturing a semiconductor device is provided to improve the tolerance against the electrostatic discharge by allowing the heat to be dispersed over an edge portion of a drain area. CONSTITUTION: A pad oxide layer, a polycrystalline layer, a nitride layer and a photoresist f...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	JEONG, JE-HYEOK
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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