SEMICONDUCTOR INTEGRATED CIRCUIT
DC voltage VREF produced in an LSI and having a value between power supply voltage VDD and the ground potential is applied to the gate electrode of pMOS transistor QP1 which forms a function determination circuit. Since the gate voltage of a transistor QP1 is lower than that in a conventional functi...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | DC voltage VREF produced in an LSI and having a value between power supply voltage VDD and the ground potential is applied to the gate electrode of pMOS transistor QP1 which forms a function determination circuit. Since the gate voltage of a transistor QP1 is lower than that in a conventional function determination circuit, current through the transistor QP1 is reduced. Hence, the gate length of the transistor QP1 can be reduced. When a second pMOS transistor is connected in parallel to the transistor QP1 so that the transistor has a function for supplying charge to junction A when power is fed to the LSI, the area of the transistor QP1 can be further reduced. When a voltage produced for a purpose other than for the function determination circuit such as a step-down power supply of the LSI is used as DC voltage, the area of the transistor can be reduced. |
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