POSITIVE PHOTORESIST COMPOSITION

A positive photoresist composition consisting essentially of a photosensitive component comprising an ester of 2,3,4,4 min -tetrahydroxybenzophenone, having on the average, greater than 3.2 of the hydroxy groups of the 2,3,4,4 min -tetrahydroxybenzophenone esterified by 1,2-naphthoquinonediazide-5-s...

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Bibliographische Detailangaben
Hauptverfasser:	CHATTERJEE, SUBHANKAR, JAIN, SANGYA, DICARLO, JOHN
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A positive photoresist composition consisting essentially of a photosensitive component comprising an ester of 2,3,4,4 min -tetrahydroxybenzophenone, having on the average, greater than 3.2 of the hydroxy groups of the 2,3,4,4 min -tetrahydroxybenzophenone esterified by 1,2-naphthoquinonediazide-5-sulfonic acid; and a water insoluble, aqueous alkali soluble novolak resin obtained by condensing with formaldehyde a mixture of from about 2.0 to about 5.0 mol percent of 2,4-xylenol, from about 1.5 to about 4.5 mol percent of 2,5-xylenol, from about 1.5 to about 4.0 mol percent of 2,6-xylenol, from about 2.0 to about 5.0 mol percent o-ethylphenol, and the balance m-cresol and p-cresol in a respective mol ratio of from about 0.5 to about 2.0 to 1.