CYCLICAL ORGANIC - METAL COMPOUND

내용없음 The invention relates to cyclic organometallic compounds which are intramolecularly stabilized and also to their use to produce thin films and epitaxial layers by gas-phase deposition.

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Bibliographische Detailangaben
Hauptverfasser: HOSTALEK, MARTIN DR, POHL, LUDWIG DR, LOKAI, MATTHIAS, ERDMANN, DIETRICH DR
Format: Patent
Sprache:eng ; kor
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Beschreibung
Zusammenfassung:내용없음 The invention relates to cyclic organometallic compounds which are intramolecularly stabilized and also to their use to produce thin films and epitaxial layers by gas-phase deposition.