NEGATIVE PHOTORESIST BASED ON POLYPHENOL AND SELECTED EPOXY OR VINYL ETHER COMPOUND

PURPOSE: To obtain a negative photoresist by incorporating film formable polyphenols, multifunctional epoxy resins and/or multifunctional vinyl ether compds., cationic photopolymn. initiators for these compds. and commonly used additives into this photoresist. CONSTITUTION: This compsn. basically co...

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Bibliographische Detailangaben
Hauptverfasser:	MARUCHIN ROOTO, ADORIAN SHIYURUTESU, HAINTSU BUOREBU, KURUTO MAIYAA
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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