NEGATIVE PHOTORESIST BASED ON POLYPHENOL AND SELECTED EPOXY OR VINYL ETHER COMPOUND

PURPOSE: To obtain a negative photoresist by incorporating film formable polyphenols, multifunctional epoxy resins and/or multifunctional vinyl ether compds., cationic photopolymn. initiators for these compds. and commonly used additives into this photoresist. CONSTITUTION: This compsn. basically co...

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Bibliographische Detailangaben
Hauptverfasser: MARUCHIN ROOTO, ADORIAN SHIYURUTESU, HAINTSU BUOREBU, KURUTO MAIYAA
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:PURPOSE: To obtain a negative photoresist by incorporating film formable polyphenols, multifunctional epoxy resins and/or multifunctional vinyl ether compds., cationic photopolymn. initiators for these compds. and commonly used additives into this photoresist. CONSTITUTION: This compsn. basically contains (a) at least one kind of the solid film formable polyphenols, (b) at least one kind of the multifunctional epoxy resins and/or multifunctional vinyl ether compds. which respectively dissolve by forming salts in an aq. alkaline soln. in an uncured state, (c) the cationic photopolymn. initiators for at least one kind of the components (b) and (d) the commonly used additives as desired. Since the material has high sensitivity, high-speed writing by a laser beam of relatively low intensity is made possible and therefore, the material is extremely advantageous. Printed circuits in electronic industry, lithographic offset printing plates or relief printing plates and photographic image recording materials are produced by this method.