METHOD AND APPARATUS FOR REMOVING ORGANIC POLYMER FILM
PURPOSE:To remove a substance adhered to the surface or on a side wall of a mask layer by a method wherein the organic polymer material mask layer is formed on an object to be processed, the object to be processed is processed by making use of an organic polymer material as a mask and a plasma treat...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | PURPOSE:To remove a substance adhered to the surface or on a side wall of a mask layer by a method wherein the organic polymer material mask layer is formed on an object to be processed, the object to be processed is processed by making use of an organic polymer material as a mask and a plasma treatment is executed while the surface of a substrate structure containing the organic polymer mask layer is faced downward. CONSTITUTION:While the surface of a substrate structure containing an organic polymer mask layer 3 is faced downward, the substrate structure 4 is mounted on a supporting structure 5. Then, a plasma treatment using oxygen gas is executed; a foreign substance 6 adhered to the organic high-polymer mask layer 3 falls due to gravity combined with its lift-off effect; it can be removed without coming into contact with the surface of a material 2 to be processed and discharged to the outside through an exhaust port of a chamber. |
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