ELECTRODE ETCHING SOLUTION OF ALUMINUM ELECTROLYTIC CAPACITOR
PURPOSE:To reduce a cost of an etching solution and to control the solution economically by a method wherein new HCl is added to obtain a specific range of the effective HCl concentration and a working life of the etching solution is lengthened until the total HCl concentration reaches a specific va...
Gespeichert in:
| Hauptverfasser: | , , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | KANZAKI NOBUYOSHI NAKANO KATSUTOSHI SUGINO SATOSHI |
| description | PURPOSE:To reduce a cost of an etching solution and to control the solution economically by a method wherein new HCl is added to obtain a specific range of the effective HCl concentration and a working life of the etching solution is lengthened until the total HCl concentration reaches a specific value. CONSTITUTION:A drop in an etching magnification is not so related to a dissolved quantity of aluminum in an etching solution; the etching magnification drops remarkably when the effective HCl; concentration becomes ON. Accordingly, even when the dissolved quantity of aluminum is more than 10g/l, the etching magnification can be maintained if the effective HCl concentration is more than 0.1 N. If the effective HCl concentration is within 0.1N-1.3 N, the drop in the etching magnification is small. That is to say, if new hydrochloric acid is added continuously to obtain a range of 0.1N-1.3 N of the effective HCl concentration and the concentration is controlled, it is possible to nearly double the working life of the etching solution. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JPS6453526A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JPS6453526A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JPS6453526A3</originalsourceid><addsrcrecordid>eNrjZLB19XF1Dgnyd3FVcA1x9vD0c1cI9vcJDfH091Pwd1Nw9An19fQL9VWAKvOJDPF0VnB2DHB09gzxD-JhYE1LzClO5YXS3AwKbiBjdFML8uNTiwsSk1PzUkvivQKCzUxMjU2NzByNiVACAAgmKhQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>ELECTRODE ETCHING SOLUTION OF ALUMINUM ELECTROLYTIC CAPACITOR</title><source>esp@cenet</source><creator>KANZAKI NOBUYOSHI ; NAKANO KATSUTOSHI ; SUGINO SATOSHI</creator><creatorcontrib>KANZAKI NOBUYOSHI ; NAKANO KATSUTOSHI ; SUGINO SATOSHI</creatorcontrib><description>PURPOSE:To reduce a cost of an etching solution and to control the solution economically by a method wherein new HCl is added to obtain a specific range of the effective HCl concentration and a working life of the etching solution is lengthened until the total HCl concentration reaches a specific value. CONSTITUTION:A drop in an etching magnification is not so related to a dissolved quantity of aluminum in an etching solution; the etching magnification drops remarkably when the effective HCl; concentration becomes ON. Accordingly, even when the dissolved quantity of aluminum is more than 10g/l, the etching magnification can be maintained if the effective HCl concentration is more than 0.1 N. If the effective HCl concentration is within 0.1N-1.3 N, the drop in the etching magnification is small. That is to say, if new hydrochloric acid is added continuously to obtain a range of 0.1N-1.3 N of the effective HCl concentration and the concentration is controlled, it is possible to nearly double the working life of the etching solution.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; CAPACITORS ; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES ORLIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 ; NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE</subject><creationdate>1989</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19890301&DB=EPODOC&CC=JP&NR=S6453526A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,778,883,25551,76302</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19890301&DB=EPODOC&CC=JP&NR=S6453526A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KANZAKI NOBUYOSHI</creatorcontrib><creatorcontrib>NAKANO KATSUTOSHI</creatorcontrib><creatorcontrib>SUGINO SATOSHI</creatorcontrib><title>ELECTRODE ETCHING SOLUTION OF ALUMINUM ELECTROLYTIC CAPACITOR</title><description>PURPOSE:To reduce a cost of an etching solution and to control the solution economically by a method wherein new HCl is added to obtain a specific range of the effective HCl concentration and a working life of the etching solution is lengthened until the total HCl concentration reaches a specific value. CONSTITUTION:A drop in an etching magnification is not so related to a dissolved quantity of aluminum in an etching solution; the etching magnification drops remarkably when the effective HCl; concentration becomes ON. Accordingly, even when the dissolved quantity of aluminum is more than 10g/l, the etching magnification can be maintained if the effective HCl concentration is more than 0.1 N. If the effective HCl concentration is within 0.1N-1.3 N, the drop in the etching magnification is small. That is to say, if new hydrochloric acid is added continuously to obtain a range of 0.1N-1.3 N of the effective HCl concentration and the concentration is controlled, it is possible to nearly double the working life of the etching solution.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CAPACITORS</subject><subject>CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES ORLIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25</subject><subject>NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1989</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLB19XF1Dgnyd3FVcA1x9vD0c1cI9vcJDfH091Pwd1Nw9An19fQL9VWAKvOJDPF0VnB2DHB09gzxD-JhYE1LzClO5YXS3AwKbiBjdFML8uNTiwsSk1PzUkvivQKCzUxMjU2NzByNiVACAAgmKhQ</recordid><startdate>19890301</startdate><enddate>19890301</enddate><creator>KANZAKI NOBUYOSHI</creator><creator>NAKANO KATSUTOSHI</creator><creator>SUGINO SATOSHI</creator><scope>EVB</scope></search><sort><creationdate>19890301</creationdate><title>ELECTRODE ETCHING SOLUTION OF ALUMINUM ELECTROLYTIC CAPACITOR</title><author>KANZAKI NOBUYOSHI ; NAKANO KATSUTOSHI ; SUGINO SATOSHI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPS6453526A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1989</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CAPACITORS</topic><topic>CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES ORLIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25</topic><topic>NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE</topic><toplevel>online_resources</toplevel><creatorcontrib>KANZAKI NOBUYOSHI</creatorcontrib><creatorcontrib>NAKANO KATSUTOSHI</creatorcontrib><creatorcontrib>SUGINO SATOSHI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KANZAKI NOBUYOSHI</au><au>NAKANO KATSUTOSHI</au><au>SUGINO SATOSHI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>ELECTRODE ETCHING SOLUTION OF ALUMINUM ELECTROLYTIC CAPACITOR</title><date>1989-03-01</date><risdate>1989</risdate><abstract>PURPOSE:To reduce a cost of an etching solution and to control the solution economically by a method wherein new HCl is added to obtain a specific range of the effective HCl concentration and a working life of the etching solution is lengthened until the total HCl concentration reaches a specific value. CONSTITUTION:A drop in an etching magnification is not so related to a dissolved quantity of aluminum in an etching solution; the etching magnification drops remarkably when the effective HCl; concentration becomes ON. Accordingly, even when the dissolved quantity of aluminum is more than 10g/l, the etching magnification can be maintained if the effective HCl concentration is more than 0.1 N. If the effective HCl concentration is within 0.1N-1.3 N, the drop in the etching magnification is small. That is to say, if new hydrochloric acid is added continuously to obtain a range of 0.1N-1.3 N of the effective HCl concentration and the concentration is controlled, it is possible to nearly double the working life of the etching solution.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_JPS6453526A |
| source | esp@cenet |
| subjects | BASIC ELECTRIC ELEMENTS CAPACITORS CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES ORLIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE |
| title | ELECTRODE ETCHING SOLUTION OF ALUMINUM ELECTROLYTIC CAPACITOR |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-15T21%3A48%3A56IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=KANZAKI%20NOBUYOSHI&rft.date=1989-03-01&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJPS6453526A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |