ELECTRODE ETCHING SOLUTION OF ALUMINUM ELECTROLYTIC CAPACITOR

PURPOSE:To reduce a cost of an etching solution and to control the solution economically by a method wherein new HCl is added to obtain a specific range of the effective HCl concentration and a working life of the etching solution is lengthened until the total HCl concentration reaches a specific va...

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Bibliographische Detailangaben
Hauptverfasser: KANZAKI NOBUYOSHI, NAKANO KATSUTOSHI, SUGINO SATOSHI
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:PURPOSE:To reduce a cost of an etching solution and to control the solution economically by a method wherein new HCl is added to obtain a specific range of the effective HCl concentration and a working life of the etching solution is lengthened until the total HCl concentration reaches a specific value. CONSTITUTION:A drop in an etching magnification is not so related to a dissolved quantity of aluminum in an etching solution; the etching magnification drops remarkably when the effective HCl; concentration becomes ON. Accordingly, even when the dissolved quantity of aluminum is more than 10g/l, the etching magnification can be maintained if the effective HCl concentration is more than 0.1 N. If the effective HCl concentration is within 0.1N-1.3 N, the drop in the etching magnification is small. That is to say, if new hydrochloric acid is added continuously to obtain a range of 0.1N-1.3 N of the effective HCl concentration and the concentration is controlled, it is possible to nearly double the working life of the etching solution.