POSITIVE TYPE PHOTORESIST COMPOSITION

PURPOSE:To enhance sensitivity without impairing a residual film rate by incorporating at least one of naphthols in the photoresist composition. CONSTITUTION:The photoresist composition of the title contains a novolak resin (A), a quinonediazide compound as a photosensitive agent, and the naphthol (...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	NINOMIYA TAKAO, KAMIYA YASUNORI, HANABATAKE MAKOTO, FURUTA AKIHIRO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR AUXILIARY PROCESSES IN PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHYSICS
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