METHOD FOR CRUSHING HIGH PURITY SILICON
PURPOSE:To minimize the contamination of silicon product crushing and to prevent the formation of fine powder or particles by crushing heated high purity silicon by rapid cooling caused by contact with a liq. inert cooling medium. CONSTITUTION:Heated high purity silicon is crushed by rapid cooling c...
Gespeichert in:
Hauptverfasser: | , , , , |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | PURPOSE:To minimize the contamination of silicon product crushing and to prevent the formation of fine powder or particles by crushing heated high purity silicon by rapid cooling caused by contact with a liq. inert cooling medium. CONSTITUTION:Heated high purity silicon is crushed by rapid cooling caused by contact with a liq. inert cooling medium. The heated high purity silicon is preferably in the form of granules or a melt and the pref. heating temp. is 500-1500 deg.C. The liq. inert cooling medium is a liquefied gas, preferably liquefied helium, neon, argon, nitrogen or hydrogen. |
---|